بررسی ریزساختار و حوزه های فروالکتریک لایه نازک هم محور تیتانات سرب رشدیافته با روش رسوب گذاری از فاز مایع

یوردخانی, امین

doi:10.30501/jamt.2020.205466.1049

نوع مقاله : مقاله کامل پژوهشی

نویسنده

امین یوردخانی

بخش مهندسی مواد، دانشکده فنی و مهندسی، دانشگاه تربیت مدرس، تهران، تهران، ایران

https://doi.org/10.30501/jamt.2020.205466.1049

چکیده

در این تحقیق، لایه نازک تیتانات سرب (PTO)، با ضخامت nm 150، با استفاده از روش رسوب گذاری از فاز مایع، روی زیرلایه تک بلور تیتانات استرانسیم آلائیده شده با Nb با جهت بلوری [001]، رشد داده شده است. نتایج پراش پرتو ایکس با قدرت تفکیک بالا (HR-XRD)، نشان داد که لایه PTO، در جهت [001]، رشد یافته است. لایه نازک، زیرلایه، تقارن درجه چهار لایه نازک و زیرلایه، به وسیله روبش زاویه ф، به اندازه 360 درجه، حول صفحات {102}، تأیید شد؛ بنابراین، لایه، به طور کامل، در جهت بلوری c، رشد یافته است. نقشه فضایی وارون حول صفحه (103) لایه و زیرلایه، نشان داد که لایه نازک، تحت کرنش فشاری صفحه ای است. ثوابت شبکه ای محاسبه شده لایه PTO از موقعیت قله ها در محورهای عمودی و افقی، به میزان nm 403/0a= و nm 407/0c= است. این تنش فشاری، به دلیل تشکیل فصل مشترک همدوس در فصل مشترک لایه و زیرلایه و عدم انطباق ثوابت شبکه لایه و زیرلایه، ایجاد شده است. مطالعات توپوگرافی AFM، نشان داد که لایه نازک، از دانه های کشیده ای تشکیل شده است که در جهت های [001] و [010]، رشد کرده اند. پیکربندی حوزه های فروالکتریک با میکروسکوپ نیروی پیزوالکتریکی (PFM)، مطالعه شد. نتایج، نشان داد که لایه، از حوزه های فروالکتریک، با مرز زاویه 180 و 90 درجه، تشکیل شده است. تشکیل حوزه های فروالکتریک با مرز زاویه 90 درجه، در اثر کرنش فشاری ایجاد شده در لایه، به دلیل عدم انطباق ثوابت شبکه لایه و زیرلایه است. در واقع، حوزه های فروالکتریکی با مرز 90 درجه، جهت کاهش انرژی الاستیک لایه، تشکیل شده است.

کلیدواژه‌ها

موضوعات

عنوان مقاله [English]

Investigation of Microstructure and Ferroelectric Domain of Epitaxial PbTiO3 Thin Film Grown by Liquid Phase Deposition

نویسنده [English]

Amin Yourdkhani

Department of Materials Engineering, Faculty of Engineering, Tarbiat Modares University, Tehran, Tehran, Iran

چکیده [English]

In this research, PbTiO₃ (PTO) thin films with 150 nm thickness were grown on (001) Nb-doped SrTiO₃ substrate. High-resolution X-ray diffraction (HR-XRD) studies showed that the PTO films are epitaxial with [001] orientation. The ф-scan of the film and substrate around {102} revealed a fourfold symmetry for both demonstrating [001] perfect orientation of the films. XRD reciprocal space map around (103) of the film and substrate revealed that film is fully strained with a compressive strain. The lattice constants calculated from the horizontal and vertical peak positions are; a = 0.403 nm and c = 0.407 nm. This compressive strain was developed due to the coherent interface formation in the film and substrate interface and the lattice parameter mismatch of the film with respect to the substrate. Topography studies by atomic force microscopy (AFM) showed that films are highly uniform with densely packed elongated grains developed along the [100] and [010] orientations. Ferroelectric domain configuration of the film was investigated by a piezoelectric force microscope (PFM). Two types of 180 and 90 degrees ferroelectric domains were observed. The epitaxial compressive strain is responsible for the formation of 90 degree domains. The developed strain via the lattice mismatch between the PTO layer and the substrate enforces electrical dipoles to rotate away from the normal direction to compensate the elastic energy of the film.

کلیدواژه‌ها [English]

Thin Films
Lead Titanate
Epitaxial Growth
Ferroelectric Domains

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مواد و فناوری‌های پیشرفته

بررسی ریزساختار و حوزه های فروالکتریک لایه نازک هم محور تیتانات سرب رشدیافته با روش رسوب گذاری از فاز مایع

مراجع

مراجع

دوره 9، شماره 2
شهریور 1399
صفحه 73-79

بررسی ریزساختار و حوزه های فروالکتریک لایه نازک هم محور تیتانات سرب رشدیافته با روش رسوب گذاری از فاز مایع

مراجع

مراجع

دوره 9، شماره 2شهریور 1399صفحه 73-79

دوره 9، شماره 2
شهریور 1399
صفحه 73-79