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تأثیر فشار گاز بر نیتریده شدن بدنه‌های سیلیسیم

نوع مقاله : مقاله کامل پژوهشی

نویسندگان

1 کارشناسی ارشد، پژوهشکده سرامیک، پژوهشگاه مواد و انرژی، کرج، البرز، ایران

2 دانشیار، پژوهشکده سرامیک، پژوهشگاه مواد و انرژی، کرج، البرز، ایران

10.30501/jamt.2023.395051.1274

چکیده

وجود ویژگی­ های مهمی نظیر استحکام مناسب، ثابت دی­ الکتریک پایین، تانژانت تلفات کم و مقاومت در برابر سایش و شوک حرارتی در نیتریدسیلیسیم (Si3N4) باعث شده تا این سرامیک، یکی از معدود سرامیک­ های مناسب برای کاربرد در محافظ آنتن ­ها باشد. باتوجه‌به دشواری سینتر کردن پودر Si3N4، در این پژوهش ساخت این ماده به روش نیتریده کردن پودر سیلیسیم فشرده‌شده به­ روش پرس و بدون استفاده از افزودنی­ ها بررسی شد؛ زیرا تأثیر افزودنی­ها بر افت خواص اثبات شده است. دراین‌راستا، پودر سیلیسیم به­ همراه 0، 5/0، 7/0 و 1 درصد وزنی اکسیدآهن به­ روش پرس، شکل­ دهی و در فشار گاز نیتروژن 200، 400 و 600 میلی­ بار تحت دمای 1420 درجه سلسیوس به­ مدت 2 ساعت نیتریده شد. چگالی، تخلخل، ترکیب فاز و ریزساختار نمونه ­ها بررسی شد و نتایج آنالیزها نشان داد که حداقل فشار بهینه برای نیتریده کردن، 600 میلی­بار و بهینه درصد اکسیدآهن، 5/0 درصد وزنی می­ باشد.

کلیدواژه‌ها

موضوعات

عنوان مقاله [English]

The Effect of Gas Pressure on the Nitridation of Silicon Bodies

نویسندگان [English]

  • Mehdi Okhovat Ghahfarokhi 1
  • Hudsa Majidian 2
  • Mohammad Zakeri 2

1 MSc, Department of Ceramic, Materials and Energy Research Center, Karaj, Alborz, Iran

2 Associate Professor, Department of Ceramic, Materials and Energy Research Center, Karaj, Alborz, Iran

چکیده [English]

: The important characteristics of silicon nitride (Si3N4) such as proper strength, low dielectric constant, low loss tangent, and high wear and thermal shock resistance have facilitated its widespread application in antenna protection. Due to the difficulties in sintering the Si3N4 samples, fabrication of this body in this research was investigated by nitridating a pressed silicon powder without using any additive since the effect of such additives on the loss of properties has been already proven. In this regard, silicon powder along with 0, 0.5, 0.7, and 1 wt.% of iron oxide were pressed and then nitridated at the temperature of 1420°C for two hours under the different nitrogen gas pressures of 200, 400, and 600 millibars. The density, porosity, phase composition, and microstructure of the samples were finally evaluated. The results showed that the minimum pressure for nitridation and optimal percentage of iron oxide were 600 millibars and 0.5 wt.%, respectively.

کلیدواژه‌ها [English]

  • Silicon Nitride
  • Nitridation
  • Gas Pressure
  • Phase Analysis
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