The Effect of Sintering Process on Electrical and Microstructural Properties of Barium-Strontium-Titanate Sputtering Target and its Thin Film

Derakhshandeh, Mohammad Reza; Eshraghi, Mohamad Javad

doi:10.30501/jamt.2017.70374

Authors

¹ Materials and Energy Research Center, Department of Ceramic, Tehran, Iran

² Materials and Energy Research Center, Department of Semiconductors, Tehran, Iran

https://doi.org/10.30501/jamt.2017.70374

Abstract

In this study the effect of sintering parameters on the microstructure and electrical properties of the barium
strontium titanate sputtering target is investigated. For optimizing the sintering temperature, BST compacts sintered at
various temperatures ranging from 1200 to 1400 ºC for 2 hours. The sintered Barium Strontium Titanate sputtering
target comprising with a high density, purity and a fine-grained microstructure has been also fabricated. Optimized
calcining and sintering condition was obtained by controlling sintering temperature and time to fabricate single phase,
high relative density sintered body. A relative density of up to 95% and mean grain size of 8 µm were reached at the
sintering temperature of 1250C. The relative permittivity of thin films at 10 KHz was around 4400. Also the thin film
bandgap was around 3.2 eV. The densities of the sintered samples were measured using the Archimedes method.
Characteristics of the body were analyzed by X-ray diffraction (XRD), optical microscopy. Dielectric permittivity (εr)
were measured with an HP 4192A impedance analyzer and thin film bandgap was analyzed by UV-Vis method.

Keywords

References

1. Graddage, N., Chu, T.-Y., Ding, H., Py, C., Dadvand, A. and Tao, Y., Inkjet printed thin and uniform dielectrics for capacitors and organic thin film transistors enabled by the coffee ring effect, Organic Electronics, 29 (2016) 114-119.

2. Yang, Y., Li, L., Ruan, G., Fei, H., Xiang, C., Fan, X. and Tour, J.M., Hydrothermally Formed ThreeDimensional Nanoporous Ni(OH)2 Thin-Film Supercapacitors, ACS Nano, 8(9) (2014) 9622–9628.

3. Roy, D. and Krupanidhi, S.B., Excimer laser ablated barium strontium titanate thin films for dynamic random access memory applications, Applied Physics Letters, 62 (1993) 1056-1058.

4. Bao, P., Jackson, T.J., Wang, X. and Lancaster, M.J., Barium strontium titan ate thin film varactors for roomtemperature microwave device applications, Journal Of Physics D: Applied Physiscs, 41 (2008) 063001.

5. Kwon, S.R., Huang1, W.B., Zhang, S.J. , Yuan, F.G. and Jiang, X.N., Flexoelectric sensing using a multilayered barium strontium titanate structure, Smart Matterials And Structures, 22 (2013) 115017-115024.

6. Bao, D., Wang, Z., Ren, W., Zhang, L. and Yao , X., Crystallization kinetics of Ba0.8Sr0.2TiO3 sols and sol– gel synthesis of Ba0.8Sr0.2TiO3 thin films, Ceramics International, 25 (1999) 261-265.

7. Mohammadi, M.R. and Fray, D.J., Sol–gel derived nanocrystalline and mesoporous barium strontium titanate prepared at room temperature, Particuology, 9 (2011) 235-242.

8. Adikary, S.U. and Chan, H.L.W., Ferroelectric and dielectric properties of sol–gel derived BaxSr1-xTiO3 thin films, Thin Solid Films, 424 (2003) 70-74.

9. Xu, H., MMICs using GaN HEMTs and Thin-Film BST Capacitors, PhD thesis, University of California, Santa Barbara, Santa Barbara, (2005).

10. Reynolds, G.J., Kratzer, M., Dubs, M., Felzer, H. and Mamazza, R., Sputtered Modified Barium Titanate for Thin-Film Capacitor Applications, Materials, 5 (2012) 575-589.

11. Hu, W., Yang, C., Zhang, W. and Liu, G., Characteristics of Ba0.8Sr0.2TiO3 ferroelectric thin films by RF magnetron sputtering, Ceramics International, 33 (2007) 1299-1303.

12. Kawahara, T., Yamauka, M., Makita, T., Naka, J., Yuuki, A., Mikami, N. and Ono, K., Step coverage and electrical properties of (Ba, Sr)TiO3 films prepared by liquid source chemical vapor deposition using TiO(DPM)2, Japanese Journal of Applied Physics, 33 (1994) 5129–5134.

13. Feil, W.A., Wessels, B.W., Tonge, L.M. and Marks, T.J., Organometallic chemical vapor deposition of strontium titan ate, Journal of Applied Physics, 67 (1990) 3858– 3861.

14. Sakabe, Y., Takeshima, Y., Tanaka, K., Multilayer ceramic capacitors with thin (Ba,Sr)TiO3 layers by MOCVD, Journal Electroceramics, 3 (1999) 115–121.

15. Weiss, F., Lindner, J., Sénateur, J.P., Dubourdieu, C., Galindo, V., Audier, M., Abrutis, A., Rosina, M., Fröhlich, K., Haessler, W., Oswald, S., Figueras, A. and Santiso, J., Injection MOCVD: ferroelectric thin films and functional oxide superlattice, Surface and Coatings Technology, 133–134 (2000) 191–197.

16. Jia, Q.X., Chang, L.H., Anderson, W.A., Low leakage current BaTiO3 thin film capacitors using a multilayer construction, Thin Solid Films, 259 (1995) 264–269.

17. Aijaz, A., Ji, Y.-X., Montero, J., Niklasson, A. and Granqvist, G., TomášKubart, Low-temperature synthesis of thermochromic vanadium dioxide thin films by reactive high power impulse magnetron sputtering, Solar Energy Materials and Solar Cells, 149 (2016) 137-144.

18. Wu, T.B., Wu, C.M. and Chen, M.L, Highly insulative barium zirconate-titanate thin films prepared by RF magnetron sputtering for dynamic random access memory applications, Applied Physics Letters, 69 (1996) 2659–2661.

19. Park, H.K., Ryu, J.H., Youn, H.J., Yang, J.-M. and Oh, I.H., Fabrication and Property Evaluation of Mo Compacts for Sputtering Target ,Application by Spark Plasma Sintering Process, Materials Transactions, 53 (2012) 1056 -1061.

20. Kazuo, W. and Akifumi, M., Sputtering target of dielectrics having high strength and a method for manufacturing same, US patent 6,176,986Bl 21. Kanamaru, M., Iwasaki, Y., Matsui, M., Goto, H. and Nambu, A., Oxide sintered body and sputtering target, US patent 9,175,380 B2.

22. Mulyadi1, Rika, W., Sulidah, Irzaman, Hardhienata, H., Barium Strontium Titanate Thin Film Growth with rotational speed variation as a satellite temperature sensor prototype, Earth and Environmental Science, 54 (2017) 012094.

Journal of Advanced Materials and Technologies

The Effect of Sintering Process on Electrical and Microstructural Properties of Barium-Strontium-Titanate Sputtering Target and its Thin Film

References

References

Volume 6, Issue 3
March 2017
Pages 79-85

The Effect of Sintering Process on Electrical and Microstructural Properties of Barium-Strontium-Titanate Sputtering Target and its Thin Film

References

References

Volume 6, Issue 3March 2017Pages 79-85

Volume 6, Issue 3
March 2017
Pages 79-85