Journal of Advanced Materials and Technologies

Journal of Advanced Materials and Technologies

Microstructure, morphology, and electrocatalytic performance of n-type semiconductor DLC coating deposited on Titanium via PECVD

Document Type : Original Reaearch Article

Authors
1 PhD student at Faculty of Materials and Manufacturing Technologies, Malek Ashtar University of Technology, Tehran, Iran.
2 Associate Professor at Faculty of Materials and Manufacturing Technologies, Malek Ashtar University of Technology, Tehran, Iran.
10.30501/jamt.2026.562840.1348
Abstract
Unlocking the full electrochemical potential of diamond-like carbon (DLC) thin films hinges on a nuanced understanding of their synthesis parameters. This study meticulously investigates the profound influence of the methane-to-hydrogen gas ratio on the electrocatalytic performance of DLC films precisely fabricated via direct current plasma-enhanced chemical vapor deposition (DCPECVD). A systematic exploration across methane flow rates from 0.5 to 4.5 sccm revealed a dramatic impact on the film’s microstructure, particularly its sp³/sp² hybridization ratio and grain morphology. The morphology and structure of the samples were studied by scanning electron microscopy (SEM) and Raman spectroscopy, while electrochemical behavior was quantitatively assessed via electrochemical impedance spectroscopy (EIS) and Mott–Schottky analysis. The findings unequivocally establish a direct correlation between methane concentration and both the structural attributes and electrochemical efficacy of the DLC coatings. Strikingly, an optimized methane concentration of 0.5 sccm yielded DLC films with an excellent microstructure, marked by a higher sp³/sp² ratio and finely uniform grain structures, which in turn facilitated markedly enhanced electrocatalytic activity. Furthermore, consistent n-type semiconductor conductivity was observed across all investigated DLC samples.
Keywords
Subjects

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Volume 14, Issue 4
Winter 2026
Pages 90-104

  • Receive Date 16 December 2025
  • Revise Date 09 February 2026
  • Accept Date 16 June 2026